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Vapor generation system

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Description: A chemical system for generating controlled gas and vapor mixtures


Year of Manufacture and Installation: 2009 / 2009

System capabilities:

- Air and nitrogen gas mixtures (0-100 %) as carrier gas.

- Humidified carrier gas (0-90 %RH).

- Chemical vapors in a wide concentration range in dry or humidified carrier gas. Especially generating vapors of organic solvents and volatile organic compounds (e.g. ethanol, acetone, toluene, etc.) is easy.


The system can be used for

- Characterization of any devices, including gas sensors, in various gas atmospheres.

- The generated gas mixtures can be used in various processes, for example annealing in controlled atmosphere.


Contact person:

Aapo Varpula / Electron Physics Group
Department of Micro and Nanosciences
Aalto University
aapo.varpula(at)tkk.fi
Tel. +358 9 470 24985
Fax +358 9 470 25008

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